Research Article
High-performance Pulse Electroplating Power Supply Control System

Mingji Zhou, Leina Shi and Hui Li

Information Technology Journal, 2013, 12(18), 4655-4658.


The tradition electroplating power is large and the output ripple is big. The study presents a multi-waveform pulse electroplating power equipped with Samsung S3C2440. Changing the power pulse frequency, duty cycle and parameters of pulse current work, such as time, direction, size and so on, this completes the kinds of pulse waveform portfolio and average pulse current keeps unchanged. It achieved the long-distance communication and remote display. The design not only increases the life span of electronic components and reliability and enhances coating effects but also can be popularized in other kinds of plating.

ASCI-ID: 28-2729

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