T. Detchprohm, M. Zhu, Y. Li, Y. Xia, L. Liu, D. Hanser and C. Wetzel
Journal of Crystal Growth, 2009, 311(10), 2937-2941. DOI: 10.1016/j.jcrysgro.2009.01.060
We demonstrate homoepitaxial growth of GaInN/GaN-based green (500560 nm) light emitting diodes (LEDs) on a-plane and m-plane quasi-bulk GaN prepared by hydride vapor phase epitaxy (HVPE). We find that in order to achieve an emission peak wavelength beyond 500 nm, a minimum InN-fraction of 14% is needed for both, a- and m-plane quantum wells (QWs), while
8% are enough for c-plane-oriented QWs. Besides increasing the InN-fraction in these non-polar QWs, widening the QW also proves to effectively shift the emission to longer wavelengths without loosing efficiency with the benefit of maintaining a low InN-fraction.
ASCI-ID: 2649-46
Journal of Crystal Growth, 2009, 311(10), 2772-2775. DOI: 10.1016/j.jcrysgro.2009.01.005
Electron-carrier generation by edge dislocations in InN films: First-principles studyJournal of Crystal Growth, 2009, 311(10), 2767-2771. DOI: 10.1016/j.jcrysgro.2009.01.019
In-situ cyclic pulse annealing of InN on AlN/Si during IR-lamp-heated MBE growthJournal of Crystal Growth, 2009, 311(10), 2776-2779. DOI: 10.1016/j.jcrysgro.2009.01.006
Growth and characterization of N-polar and In-polar InN films by RF-MBEJournal of Crystal Growth, 2009, 311(10), 2780-2782. DOI: 10.1016/j.jcrysgro.2009.01.034
Heteroepitaxial growth of InN layers on (1 1 1) silicon substratesJournal of Crystal Growth, 2009, 311(10), 2783-2786. DOI: 10.1016/j.jcrysgro.2009.01.007
Crystal growth of InN by MOCVD with electric field along the c-axisJournal of Crystal Growth, 2009, 311(10), 2806-2808. DOI: 10.1016/j.jcrysgro.2009.01.012
Selective area metal-organic vapor-phase epitaxy of InN, GaN and InGaN covering whole composition rangeJournal of Crystal Growth, 2009, 311(10), 2809-2812. DOI: 10.1016/j.jcrysgro.2009.01.013
0.4)" style="text-decoration:none">Mg doping behavior of MOVPE InxGa1-xN (xJournal of Crystal Growth, 2009, 311(10), 2817-2820. DOI: 10.1016/j.jcrysgro.2009.01.015
Flow modulation effect on N incorporation into GaAs(1-x)Nx films during chemical beam epitaxy growthJournal of Crystal Growth, 2009, 311(10), 2821-2824. DOI: 10.1016/j.jcrysgro.2009.01.020
MOVPE growth of single-crystal hexagonal AlN on cubic diamondJournal of Crystal Growth, 2009, 311(10), 2825-2830. DOI: 10.1016/j.jcrysgro.2009.01.021
Growth characteristics of AlN on sapphire substrates by modified migration-enhanced epitaxyJournal of Crystal Growth, 2009, 311(10), 2834-2836. DOI: 10.1016/j.jcrysgro.2009.01.023
Growth characteristics of AlN on sapphire substrates by modified migration-enhanced epitaxyJournal of Crystal Growth, 2009, 311(10), 2834-2836. DOI: 10.1016/j.jcrysgro.2009.01.023
Preparation of a crack-free AlN template layer on sapphire substrate by hydride vapor-phase epitaxy at 1450 °CJournal of Crystal Growth, 2009, 311(10), 2837-2839. DOI: 10.1016/j.jcrysgro.2009.01.024
MOVPE of AlN-free hexagonal GaN/cubic SiC/Si heterostructures for vertical devicesJournal of Crystal Growth, 2009, 311(10), 2840-2843. DOI: 10.1016/j.jcrysgro.2009.01.025
Formation of AlN layer on (1 1 1)Al substrate by ammonia nitridationJournal of Crystal Growth, 2009, 311(10), 2844-2846. DOI: 10.1016/j.jcrysgro.2009.01.026
AlGaN epitaxial lateral overgrowth on Ti-evaporated GaN/sapphire substrateJournal of Crystal Growth, 2009, 311(10), 2847-2849. DOI: 10.1016/j.jcrysgro.2009.01.027
AlGaN epitaxial lateral overgrowth on Ti-evaporated GaN/sapphire substrateJournal of Crystal Growth, 2009, 311(10), 2847-2849. DOI: 10.1016/j.jcrysgro.2009.01.027
Characterizations of GaN films and AlGaN/GaN heterostructures on vicinal sapphire (0 0 0 1) substrates grown by MOCVDJournal of Crystal Growth, 2009, 311(10), 2853-2856. DOI: 10.1016/j.jcrysgro.2009.01.029
Novel UV devices on high-quality AlGaN using grooved underlying layerJournal of Crystal Growth, 2009, 311(10), 2860-2863. DOI: 10.1016/j.jcrysgro.2009.01.031
Pseudomorphic growth of thick n-type AlxGa1xN layers on low-defect-density bulk AlN substrates for UV LED applicationsJournal of Crystal Growth, 2009, 311(10), 2864-2866. DOI: 10.1016/j.jcrysgro.2009.01.101
Growth and properties of semi-polar GaN on a patterned silicon substrateJournal of Crystal Growth, 2009, 311(10), 2867-2874. DOI: 10.1016/j.jcrysgro.2009.01.032
HVPE growth of semi-polar (1 1 2¯ 2)GaN on GaN template (1 1 3)Si substrateJournal of Crystal Growth, 2009, 311(10), 2875-2878. DOI: 10.1016/j.jcrysgro.2009.01.033
Reduction of dislocations in a (1 1 2¯ 2)GaN grown by selective MOVPE on (1 1 3)SiJournal of Crystal Growth, 2009, 311(10), 2879-2882. DOI: 10.1016/j.jcrysgro.2009.01.109
Reduction of dislocations in a (1 1 2¯ 2)GaN grown by selective MOVPE on (1 1 3)SiJournal of Crystal Growth, 2009, 311(10), 2879-2882. DOI: 10.1016/j.jcrysgro.2009.01.109
Reduction of dislocations in a (1 1 2¯ 2)GaN grown by selective MOVPE on (1 1 3)SiJournal of Crystal Growth, 2009, 311(10), 2879-2882. DOI: 10.1016/j.jcrysgro.2009.01.109
Mg segregation in a (1 1¯ 0 1) GaN grown on a 7° off-axis (0 0 1) Si substrate by MOVPEJournal of Crystal Growth, 2009, 311(10), 2883-2886. DOI: 10.1016/j.jcrysgro.2009.01.035
One-sidewall-seeded epitaxial lateral overgrowth of a-plane GaN by metalorganic vapor-phase epitaxyJournal of Crystal Growth, 2009, 311(10), 2887-2890. DOI: 10.1016/j.jcrysgro.2009.01.036
MOVPE growth and properties of GaN on (1 1 1)Si using an AlInN intermediate layerJournal of Crystal Growth, 2009, 311(10), 2891-2894. DOI: 10.1016/j.jcrysgro.2009.01.108
Epitaxial lateral overgrowth on (2 1¯ 1¯ 0) a-plane GaN with [0 1¯ 1 1]-oriented stripesJournal of Crystal Growth, 2009, 311(10), 2895-2898. DOI: 10.1016/j.jcrysgro.2009.01.039
Fabrication of freestanding m-plane GaN wafer by using the HVPE technique on an aluminum carbide buffer layer on an m-plane sapphire substrateJournal of Crystal Growth, 2009, 311(10), 2910-2913. DOI: 10.1016/j.jcrysgro.2009.01.094
Optical characteristics of m-plane InGaN/GaN multiple quantum well grown on LiAlO2 (1 0 0) by MOVPEJournal of Crystal Growth, 2009, 311(10), 2919-2922. DOI: 10.1016/j.jcrysgro.2009.01.042
Electrical properties and deep traps spectra in undoped M-plane GaN films prepared by standard MOCVD and by selective lateral overgrowthJournal of Crystal Growth, 2009, 311(10), 2923-2925. DOI: 10.1016/j.jcrysgro.2009.01.065
Growth of thick GaInN on grooved (1 0 1¯ 1¯) GaN/(1 0 1¯ 2¯) 4H-SiCJournal of Crystal Growth, 2009, 311(10), 2926-2928. DOI: 10.1016/j.jcrysgro.2009.01.062
Characterization of GaInN/GaN layers for green emitting laser diodesJournal of Crystal Growth, 2009, 311(10), 2942-2947. DOI: 10.1016/j.jcrysgro.2009.01.067
N-face GaN growth on c-plane sapphire by metalorganic chemical vapor depositionJournal of Crystal Growth, 2009, 311(10), 2948-2952. DOI: 10.1016/j.jcrysgro.2009.01.059
N-face GaN growth on c-plane sapphire by metalorganic chemical vapor depositionJournal of Crystal Growth, 2009, 311(10), 2948-2952. DOI: 10.1016/j.jcrysgro.2009.01.059
Nucleation characteristics of GaN nanorods grown on etched sapphire substrates by hydride vapor phase epitaxyJournal of Crystal Growth, 2009, 311(10), 2953-2955. DOI: 10.1016/j.jcrysgro.2009.01.058
Overgrowth of GaN on Be-doped coalesced GaN nanocolumn layer by rf-plasma-assisted molecular-beam epitaxyFormation of high-quality GaN microcolumnsJournal of Crystal Growth, 2009, 311(10), 2956-2961. DOI: 10.1016/j.jcrysgro.2009.01.057
Crystal growth and characterization of GaCrN nanorods on Si substrateJournal of Crystal Growth, 2009, 311(10), 2962-2965. DOI: 10.1016/j.jcrysgro.2009.01.068
Formation of gallium nitride particles during the two-stage chemical vapor processJournal of Crystal Growth, 2009, 311(10), 2966-2969. DOI: 10.1016/j.jcrysgro.2009.01.056
Effects of morphologies on the field emission characteristics of GaN nanorods grown on Si (0 0 1) by MBEJournal of Crystal Growth, 2009, 311(10), 2977-2981. DOI: 10.1016/j.jcrysgro.2009.01.054
GaN-based nitride semiconductor films deposited on nitrified HfO2/Si substrate by molecular beam epitaxyJournal of Crystal Growth, 2009, 311(10), 2996-2999. DOI: 10.1016/j.jcrysgro.2009.01.133
Low-temperature characteristics of the current gain of GaN/InGaN double-heterojunction bipolar transistorsJournal of Crystal Growth, 2009, 311(10), 3000-3002. DOI: 10.1016/j.jcrysgro.2009.01.043
Improved hot-wall MOCVD growth of highly uniform AlGaN/GaN/HEMT structuresJournal of Crystal Growth, 2009, 311(10), 3007-3010. DOI: 10.1016/j.jcrysgro.2009.01.045
Bulk GaN crystals grown by HVPEJournal of Crystal Growth, 2009, 311(10), 3011-3014. DOI: 10.1016/j.jcrysgro.2009.01.046
Growth of GaN single crystals with extremely low dislocation density by two-step dislocation reductionJournal of Crystal Growth, 2009, 311(10), 3019-3024. DOI: 10.1016/j.jcrysgro.2009.01.125
Accelerated surface flattening by alternating Ga flow in hydride vapor phase epitaxyJournal of Crystal Growth, 2009, 311(10), 3025-3028. DOI: 10.1016/j.jcrysgro.2009.01.089
Hydride vapor phase epitaxial growth of thick GaN layers with in-situ optical monitoringJournal of Crystal Growth, 2009, 311(10), 3033-3036. DOI: 10.1016/j.jcrysgro.2009.01.072
Effective reduction of bowing in free-standing GaN by N-face regrowth with hydride vapor-phase epitaxyJournal of Crystal Growth, 2009, 311(10), 3037-3039. DOI: 10.1016/j.jcrysgro.2009.01.073
Fabrication of a GaN lateral polarity junction by metalorganic chemical vapor depositionJournal of Crystal Growth, 2009, 311(10), 3044-3048. DOI: 10.1016/j.jcrysgro.2009.01.075
Fabrication of a GaN lateral polarity junction by metalorganic chemical vapor depositionJournal of Crystal Growth, 2009, 311(10), 3044-3048. DOI: 10.1016/j.jcrysgro.2009.01.075
Nitridation of Si(1 1 1) for growth of 2H-AlN(0 0 0 1)/β-Si3N4 /Si(1 1 1) structureJournal of Crystal Growth, 2009, 311(10), 3049-3053. DOI: 10.1016/j.jcrysgro.2009.01.076
Molecular beam epitaxial growth of hexagonal boron nitride on Ni(1 1 1) substrateJournal of Crystal Growth, 2009, 311(10), 3054-3057. DOI: 10.1016/j.jcrysgro.2009.01.077
Homoepitaxy on bulk ammonothermal GaNJournal of Crystal Growth, 2009, 311(10), 3058-3062. DOI: 10.1016/j.jcrysgro.2009.01.078
Defect reduction of laterally regrown GaN on GaN/patterned sapphire substratesJournal of Crystal Growth, 2009, 311(10), 3063-3066. DOI: 10.1016/j.jcrysgro.2009.01.107
Defect reduction of laterally regrown GaN on GaN/patterned sapphire substratesJournal of Crystal Growth, 2009, 311(10), 3063-3066. DOI: 10.1016/j.jcrysgro.2009.01.107
A review of III-nitride research at the Center for Quantum DevicesJournal of Crystal Growth, 2009, 311(10), 3067-3074. DOI: 10.1016/j.jcrysgro.2009.01.097
A review of III-nitride research at the Center for Quantum DevicesJournal of Crystal Growth, 2009, 311(10), 3067-3074. DOI: 10.1016/j.jcrysgro.2009.01.097
Point defects in group-III nitride semiconductors studied by positron annihilationJournal of Crystal Growth, 2009, 311(10), 3075-3079. DOI: 10.1016/j.jcrysgro.2009.01.051
Electron microscopy analysis of dislocation behavior in HVPE-AlGaN layer grown on a stripe-patterned (0 0 0 1) sapphire substrateJournal of Crystal Growth, 2009, 311(10), 3085-3088. DOI: 10.1016/j.jcrysgro.2009.01.049
HRTEM investigation of high-reflectance AlN/GaN distributed Bragg-reflectors by inserting AlN/GaN superlatticeJournal of Crystal Growth, 2009, 311(10), 3089-3092. DOI: 10.1016/j.jcrysgro.2009.01.098
An ab initio-based approach to the stability of GaN(0 0 0 1) surfaces under Ga-rich conditionsJournal of Crystal Growth, 2009, 311(10), 3093-3096. DOI: 10.1016/j.jcrysgro.2009.01.099
Relationship between defects and optical properties in Er-doped GaNJournal of Crystal Growth, 2009, 311(10), 3097-3099. DOI: 10.1016/j.jcrysgro.2009.01.048
Expansion ratio dependence of lattice vibration of GaN using ab initio molecular dynamics calculationsJournal of Crystal Growth, 2009, 311(10), 3100-3102. DOI: 10.1016/j.jcrysgro.2009.01.047
Theoretical investigation on the decomposition process of GaN(0 0 0 1) surface under a hydrogen atmosphereJournal of Crystal Growth, 2009, 311(10), 3103-3105. DOI: 10.1016/j.jcrysgro.2009.01.096
In situ gravimetric monitoring of surface reactions between sapphire and NH3Journal of Crystal Growth, 2009, 311(10), 3110-3113. DOI: 10.1016/j.jcrysgro.2009.01.079
The effect of temperature and ammonia flux on the surface morphology and composition of InxAl1−xN epitaxial layersJournal of Crystal Growth, 2009, 311(13), 3380-3385. DOI: 10.1016/j.jcrysgro.2009.04.004
Formation of GaN nanodots on Si (1 1 1) by droplet nitridationJournal of Crystal Growth, 2009, 311(13), 3389-3394. DOI: 10.1016/j.jcrysgro.2009.04.025
Growth and process modeling studies of nickel-catalyzed metalorganic chemical vapor deposition of GaN nanowiresJournal of Crystal Growth, 2009, 311(13), 3409-3416. DOI: 10.1016/j.jcrysgro.2009.03.050
Growth and process modeling studies of nickel-catalyzed metalorganic chemical vapor deposition of GaN nanowiresJournal of Crystal Growth, 2009, 311(13), 3409-3416. DOI: 10.1016/j.jcrysgro.2009.03.050
Molecular beam epitaxy of crystalline and amorphous GaN layers with high As contentJournal of Crystal Growth, 2009, 311(13), 3417-3422. DOI: 10.1016/j.jcrysgro.2009.04.010
A complementary geometric model for the growth of GaN nanocolumns prepared by plasma-assisted molecular beam epitaxyJournal of Crystal Growth, 2009, 311(13), 3423-3427. DOI: 10.1016/j.jcrysgro.2009.04.021
1H-1,2,3-triazole, a promising precursor for chemical vapor deposition of hydrogenated carbon nitrideJournal of Crystal Growth, 2009, 311(13), 3528-3532. DOI: 10.1016/j.jcrysgro.2009.04.013